Thrust Areas

  • High-Frequency Nitride Materials and Devices
  • Nanomaterial-Based Devices for Communication
  • Integrated Microwave Photonics
  • Global Modeling of High-Frequency Components
  • Super High Resolution Imaging
  • Ultra-Wide-Band Communications
 

Our Facilities

The University of Arkansas, University of Tennessee – Knoxville, and Florida International University have advanced material growth facilities, cleanrooms and material, device, and circuit characterization equipment.

UHV-PE-CVD Machine

Ultra-high vacuum plasma-enhanced chemical vapor deposition UHV-PE-CVD machine

Molecular Beam Epitaxy

Molecular beam epitaxy (MBE) growth machines and material-characterization facilities

Diffractometers

Bruker IFS66 FTIR FT-Raman/PL, X-ray Diffractometer

Optical Microscopy

Optical Microscopy Hall Effect System, XPS, AFM, 4-probe low-temp

Photoluminescence & Raman Systems

UV-Visible-NIR Photoluminescence (PL) and Raman system, Mid-IR Micro-PL system

Microwave Circuits

Microwave circuits and RF test equipment

Anechoic Chamber

Designed to completely absorb reflections of either sound or electromagnetic waves

UWB, Antenna & Radar Labs

Workspace for many advanced research projects.

Image Processing Lab

Advanced Imaging and Collaborative Information Processing

Robotics, AI

Imaging, Robotics, and Intelligent Systems

2D materials

2D materials– growth and physics

Organic Semiconductors

Novel electronic devices based on emerging materials

  • Scanning Electron Microscopy (SEM)
  • Transmission Electron Microscope (TEM)
  • Dual Beam Focused Ion Beam (FIB)
  • Scanning Probe Microscopy (SPM)
  • Energy-Dispersive X-ray Spectroscopy (EDS)
  • X-Ray Diffraction (XRD)
  • X-Ray Photoelectron Spectroscopy (XPS)
  • Agilent 5500-ILM Atomic Force Microscope (AFM)
  • VASE Ellipsometer
  • Temperature/Humidity Test Chamber
  • Cleanroom facilities
  • Room temperature and low temperature Hall measurement and resistivity measurement system
  • Solar cell testing system
  • Semiconductor laser characterization system
  • Low Temperature Co-fired Ceramics (LTCC) fabrication
  • JEOL JBX 5500FX E-Beam Lithography
  • Optical and electrical characterization facilities
  • Mid-IR micro-PL system
  • FTIR system
  • Hyperspectral scanning spectrophotometer
  • Advanced ultra-fast optical characterization system and electrical transport
  • Characterization system
  • Quantum Device Lab
  • THz time-domain spectroscopy
  • Acoustics facility
  • Pump-probe microscopy setup
  • 10GS/S Arbitrary Waveform
  • Generator
  • 8GHz Real-time Spectrum Analyzer
  • 5GS/S Mixed Signal Oscilloscope
  • 1Gs/s Oscilloscope
  • 2.4GHz Quadrature Modulator
  • 2.4GHz Quadrature Demodulator
  • Universal Software Radio Peripheral
  • FPGA Development Kit
  • DSP Development Kit
  • Triple Power Supply
  • Digital Multimeter
  • LABCONCO Class II
  • Type A2 Biosafety Hood